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AJA UHV Hybrid sputtering and ebeam evaporation system
The AJA Hybrid System is a physical vapor deposition tool which deposits films on a substrate using sputtering and e-beam evaporation methods. The AJA system is equipped with six magnetron sputtering guns, which use accelerated, positively charged ions from a plasma source to deposit films quickly. Additionally, the AJA Hybrid System contains a 4 crucible electron beam evaporation sources which evaporate high melting point materials, such as refractory metals.
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Key Features
- 6 magnetron sputtering sources with pneumatic source shutters
- 4x15cc pocket E-beam source
- Substrates up to 4”
- DC and RF generators
- Substrate heating (to 800C) and biasing
Key Applications and available processes
- Metal thin film coatings
- Sputtering configured for: Au, Ti, Ag, Al2O3, SiO2, NbTi
- Evaporation configured for: Au, Ti, Pd, V
General Documentation
AJA system SOP (standard operation procedure)
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Equipment Fee
Fabrication Service 2